Yazarlar

• Göktaş, Oktay(2)
• Göktaş, Nebile Işık(1)
• Işık Göktaş, Nebile(1)
• Yıldırım, Özal(1)
• Çakıroğlu, Dilek(1)

• MakaleYalnız künye2018Scopus SJRQ3/r/munzur/3810
  Investigation of dose and development time for thin e-beam resist poly(methyl methacrylate) for large area dense nanopattern applications

  Göktaş, Oktay; Çakıroğlu, Dilek; Yıldırım, Özal; Göktaş, Nebile Işık

  With the advance of nanotechnology, the demand for very dense nanopatterns over large areas continuously increases. Electron beam lithography is one of the main tools to realise this type of nanopattern. In this study we investigate the effect and interrelation of dose and development time for electron beam resist poly(methyl methacrylate) (PMMA) for the realisation of very large area and very dense nanopatterns. For this purpose a pattern consisting of a lattice of holes with radius of 80 nm and lattice constant of 200 nm has been designed, electron beam lithography is realised on a thin resist and a detailed SEM image inspection of the pattern is recorded. Hough transform, a pattern recognition method for the digital images, is applied to SEM images to measure the radii of the holes on the images. Interrelation between dose and development time is investigated. It is found that for a very large area of dense nanopatterns the lithographic process works better for development times shorter than typically used ones.

  İncele
• MakaleYalnız künye2017Scopus SJRQ1/r/munzur/3861
  Hough Transform as a quality test tool for electron beam lithography

  Göktaş, Oktay; Işık Göktaş, Nebile

  In this study, we use Hough Transform as a test tool to investigate the quality of the electron beam lithography. A graphene like thin film of metal layer is fabricated on top of GaAs substrate by electron beam lithography. Hough Transform is applied to the SEM images of the fabricated pattern and the quality of the lithography process is quantitatively investigated. All the existing critical dimensional measurements on the SEM images which would otherwise take several days are done in a single step. The power and potential use of Hough Transform for the SEM image inspection especially for the quality test of nano-patterning processes is demonstrated.

  AtıfScopus3·WoS3·OpenAlex4

  İncele